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Laser Produced Plasma for EUV Light Source For Lithography
EUV light Laser produced plasma Light source for tin and xenon plasma
2009/6/8
We describe properties of laser produced plasmas (LPP) for extreme ultra violet (EUV) light source for next generation lithography as an industrial application of LPP. We briefly present three topics ...
Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target
laser-produced plasma extreme ultraviolet (EUV) source
2011/5/3
In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The ...