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Laser Produced Plasma for EUV Light Source For Lithography
EUV light Laser produced plasma Light source for tin and xenon plasma
2009/6/8
We describe properties of laser produced plasmas (LPP) for extreme ultra violet (EUV) light source for next generation lithography as an industrial application of LPP. We briefly present three topics ...
Development of Extreme-Ultraviolet Light Source by Laser-Produced Plasma
Laser produced plasma Extreme Ultraviolet (EUV) Tin opacity
2009/6/1
Extreme ultraviolet (EUV) radiation from laser-produced plasma has been studied for mass-production of the next generation semiconductor devices with EUV lithography. A full set of experimental databa...
Development of Extreme-Ultraviolet Light Source by Laser-Produced Plasma
Laser produced plasma Extreme Ultraviolet (EUV) Tin opacity
2009/6/1
Extreme ultraviolet (EUV) radiation from laser-produced plasma has been studied for mass-production of the next generation semiconductor devices with EUV lithography. A full set of experimental databa...
Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target
laser-produced plasma extreme ultraviolet (EUV) source
2011/5/3
In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The ...